Interconnection structure for n/p metal gates

ABSTRACT

A method for fabricating an interconnection structure in a complementary metal-oxide-semiconductor (CMOS) includes forming an opening in a dielectric layer over a substrate and forming a dummy electrode in a first portion of the opening in the dielectric layer. The method further includes filling a second portion of the opening with a second work-function metal layer, wherein a top surface of the second work-function metal layer is below a top surface of the opening and removing the dummy electrode. The method further includes depositing a first work-function metal layer in the first and second portions, whereby the first work-function metal layer is over the second work-function metal layer in the opening and depositing a signal metal layer over the first work-function metal layer in the first and second portions.

RELATED APPLICATIONS

The present application is a divisional of U.S. application Ser. No.13/618,421, filed Sep. 14, 2012, which is a divisional application ofU.S. patent application Ser. No. 12/836,106, filed Jul. 14, 2010, bothof which are incorporated by reference herein in their entireties.

FIELD

The description relates to integrated circuit fabrication, and moreparticularly to an interconnection structure.

BACKGROUND

Semiconductor devices are used in a large number of electronic devices,such as computers, cell phones, and others. Semiconductor devicescomprise integrated circuits (ICs) that are formed on semiconductorwafers by depositing many types of thin films of material over thesemiconductor wafers, and patterning the thin films of material to formthe ICs. The ICs include field-effect transistors (FETs), such asmetal-oxide-semiconductor field-effect transistors (MOSFETs).

As technology nodes shrink, in some IC designs, there has been a desireto replace the typically poly-silicon gate electrode with a metal gateelectrode to improve device performance with the decreased featuresizes. One process of forming the metal gate electrode is termed a “gatelast” process in which the final metal gate electrode is fabricated“last” which allows for reduced number of subsequent processes,including high temperature processing, that must be performed afterformation of the gate.

FIG. 1 shows a top view of a semiconductor device 100 comprising aconventional interconnection structure 110 fabricated by a “gate last”process. The semiconductor device 100 comprises an n-type MOSFET(nMOSFET) 100 n and a p-type MOSFET (pMOSFET) 100 p. The nMOSFET 100 nis formed from the first gate electrode 110 n overlying the channelregion of the active area 104 n. The pMOSFET 100 p is formed from thesecond gate electrode 110 p overlying the channel region of the activearea 104 p. The first gate electrode 110 n and second gate electrode 110p are electrically coupled to each other and collectively hereinafterreferred to as an interconnection structure 110. The interconnectionstructure 110 is electrically coupled to a voltage source via a contact130.

FIGS. 2A-C show cross-section views taken along the respective lines ofFIG. 1. FIG. 2A illustrates a cross-sectional view of the second gateelectrode 110 p of the pMOSFET 100 p taken along the line a-a of FIG. 1.The second gate electrode 110 p may comprise a first barrier metal layer112 p, a p-type work function metal layer 114 p, a second barrier metallayer 116 p, and a signal metal layer 118 p. FIG. 2B illustrates across-sectional view of the first gate electrode 110 n of the nMOSFET100 n taken along the line b-b of FIG. 1. The first gate electrode 110 nmay comprise a first barrier metal layer 112 n, a n-type work functionmetal layer 114 n, a second barrier metal layer 116 n, and a signalmetal layer 118 n. FIG. 2C illustrates a cross-sectional view of aninterconnection structure 110 comprising both the first gate electrode110 n of the nMOSFET 100 n and the second gate electrode 110 p of thepMOSFET 100 p taken along the line c-c of FIG. 1. A contact 130 isdeposited on the interface between the first gate electrode 110 n andthe second gate electrode 110 p.

However, there are challenges to implement such features and processesin complementary metal-oxide-semiconductor (CMOS) fabrication. As thegate length and spacing between devices decrease, these problems areexacerbated. For example, it is difficult to achieve a uniform contactresistance for all CMOS devices 100 n/100 p because shifts in theposition of the contact 130 to the interconnection structure 110 causesshifts in the contact resistance to the CMOS devices 100 n/100 p. Theunstable contact resistance may provide unstable voltage supply throughthe contact 130 to the interconnection structure 110, thereby increasingthe likelihood of device instability and/or device failure.

Accordingly, what is needed is an interconnection structure in which thecontact resistance is less sensitive to process variation.

BRIEF DESCRIPTION OF THE DRAWINGS

The present disclosure is best understood from the following detaileddescription when read with the accompanying figures. It is emphasizedthat various features are not drawn to scale and are used forillustration purposes only. In fact, the dimensions of the variousfeatures in the drawings may be arbitrarily increased or reduced forclarity of discussion.

FIG. 1 shows a top view of a conventional interconnection structure;

FIGS. 2A-2C show cross-section views taken along the respective lines ofFIG. 1;

FIG. 3 is a flowchart illustrating a method for fabricating aninterconnection structure according to various aspects of the presentdisclosure;

FIG. 4 shows a top view of an interconnection structure according tovarious aspects of the present disclosure; and

FIGS. 5A-9A, 5B-9B, and 5C-9C show cross-section views taken along therespective lines of FIG. 4 at various stages of fabrication according tovarious aspects of the present disclosure.

DETAILED DESCRIPTION

It is understood that the following disclosure provides many differentembodiments, or examples, for implementing different features. Specificexamples of components and arrangements are described below to simplifythe present disclosure. These are, of course, merely examples and arenot intended to be limiting. For example, the formation of a firstfeature over or on a second feature in the description that follows mayinclude embodiments in which the first and second features are formed indirect contact, and may also include embodiments in which additionalfeatures may be formed between the first and second features, such thatthe first and second features may not be in direct contact. Variousfeatures may be arbitrarily drawn in different scales for simplicity andclarity. Further, the present disclosure may repeat reference numeralsand/or letters in the various examples. This repetition is for thepurpose of simplicity and clarity and does not in itself dictate arelationship between the various embodiments and/or configurationsdiscussed. In addition, the present disclosure provides examples of a“gate last” metal gate process, however, one skilled in the art mayrecognize applicability to other processes and/or use of othermaterials.

FIG. 3 is a flowchart illustrating a method 300 for fabricating aninterconnection structure 410 (shown in FIGS. 4 and 9C) according tovarious aspects of the present disclosure. FIG. 4 shows a top view of asemiconductor device 400 comprising an interconnection structure 410according to various aspects of the present disclosure; and FIGS. 5A-9A,5B-9B, and 5C-9C show cross-section views taken along the respectivelines of FIG. 4 at various stages of fabrication according to variousaspects of the present disclosure. It is noted that part of thesemiconductor device 400 may be fabricated with CMOS technologyprocessing. Accordingly, it is understood that additional processes maybe provided before, during, and after the method 300 of FIG. 3, and thatsome other processes may only be briefly described herein. Also, FIGS. 3through 9C are simplified for a better understanding of the inventiveconcepts of the present disclosure. For example, although the figuresillustrate an interconnection structure 410 for the semiconductor device400, it is understood the semiconductor device 400 may be part of anintegrated circuit (IC) that may comprise a number of other devicescomprising resistors, capacitors, inductors, fuses, etc.

FIG. 4 shows a top view of a semiconductor device 400 comprising aninterconnection structure 410. The semiconductor device 400 comprises annMOSFET 400 n and a pMOSFET 400 p. The nMOSFET 400 n is formed from afirst gate electrode 410 n overlying the channel region of the activearea 104 n. The pMOSFET 400 p is formed from a second gate electrode 410p overlying a channel region of the active area 104 p. The first gateelectrode 410 n comprising a first portion 418 n of a signal metal layer418 and second gate electrode 410 p comprising a second portion 418 p ofthe signal metal layer 418 are electrically coupled to each other andcollectively hereinafter referred to as an interconnection structure410. The signal metal layer 418 is electrically coupled to a voltagesource via a contact 430. It should be noted that both the first portion418 n and the second portion 418 p of the signal metal layer 418comprise the same low-resistance conductive material. Thus the secondportion 418 p of the signal metal layer 418 and the first portion 418 nof the signal metal layer 418 are a single metal layer. Therefore, ashift in the position of the contact 430 to the signal metal layer 418will not change the contact resistance to either the nMOSFET 400 n orpMOSFET 400 p since both MOSFETs share the same signal metal layer 418.Accordingly, Applicant's method of fabricating a semiconductor device400 may fabricate a fixed-contact-resistance interconnection structure410 to provide a stable voltage supply to the interconnection structure410, thereby enhancing the device performance.

Further, FIGS. 5A-9A, 5B-9B, and 5C-9C show cross-section views takenalong the respective lines of FIG. 4 at various stages of fabricationaccording to various aspects of the present disclosure. FIGS. 5A-9A showschematic cross-sectional views of a pMOSFET 400 p taken along the linea′-a′ of FIG. 4 at various stages of fabrication according to variousaspects of the present disclosure; FIGS. 5B-9B show schematiccross-sectional views of an nMOSFET 400 n taken along the line b′-b′ ofFIG. 4 at various stages of fabrication according to various aspects ofthe present disclosure; FIGS. 5C-9C show schematic cross-sectional viewsof an interconnection structure 410 taken along the line c′-c′ of FIG. 4at various stages of fabrication according to various aspects of thepresent disclosure.

Referring to FIGS. 3, 5A, 5B, and 5C, the method 300 begins at step 302wherein a substrate 102 is provided. The substrate 102 may comprise asilicon substrate. The substrate 102 may alternatively comprise silicongermanium, gallium arsenic, or other suitable semiconductor materials.The substrate 102 may further comprise other features such as variousdoped regions, a buried layer, and/or an epitaxial layer. Furthermore,the substrate 102 may be a semiconductor on insulator such as silicon oninsulator (SOI). In other embodiments, the semiconductor substrate 102may comprise a doped epi layer, a gradient semiconductor layer, and/ormay further include a semiconductor layer overlying anothersemiconductor layer of a different type such as a silicon layer on asilicon germanium layer. In other examples, a compound semiconductorsubstrate may comprise a multilayer silicon structure or a siliconsubstrate may include a multilayer compound semiconductor structure.

The semiconductor substrate 302 may comprise a first active region 104 pfor the pMOSFET 400 p, a second active region 104 n for the nMOSFET 400n and isolation regions 106. The active regions 104 p, 104 n may includevarious doping configurations depending on design requirements. Forexample, the first active region 104 p is doped with n-type dopants,such as phosphorus or arsenic; the second active region 104 n is dopedwith p-type dopants, such as boron or BF₂.

Isolation regions 106 may be formed on the substrate 102 to isolate thevarious active regions 104 p, 104 n from each other. The isolationregions 106 may utilize isolation technology, such as local oxidation ofsilicon (LOCOS) or shallow trench isolation (STI), to define andelectrically isolate the various active regions 104 p, 104 n. In thepresent embodiment, the isolation region 106 comprises a STI. Theisolation regions 106 may comprise materials such as silicon oxide,silicon nitride, silicon oxynitride, fluoride-doped silicate glass(FSG), a low-k dielectric material, and/or combinations thereof. Theisolation regions 106, and in the present embodiment, the STI, may beformed by any suitable process. As one example, the formation of the STImay include patterning the semiconductor substrate 102 by a conventionalphotolithography process, etching a trench in the substrate 102 (forexample, by using a dry etching, wet etching, and/or plasma etchingprocess), and filling the trench (for example, by using a chemical vapordeposition process) with a dielectric material. In some embodiments, thefilled trench may have a multi-layer structure such as a thermal oxideliner layer filled with silicon nitride or silicon oxide.

Still referring to FIGS. 5A, 5B, and 5C, a gate dielectric layer 108 maybe formed over the substrate 102. In some embodiments, the gatedielectric layer 108 may comprise silicon oxide, silicon nitride,silicon oxy-nitride, or high-k dielectric. High-k dielectrics comprisecertain metal oxides. Examples of metal oxides used for high-kdielectrics include oxides of Li, Be, Mg, Ca, Sr, Sc, Y, Zr, Hf, Al, La,Ce, Pr, Nd, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu and mixtures thereof.In the present embodiment, the gate dielectric layer 108 is a high-kdielectric layer comprising HfO_(x) with a thickness in the range ofabout 10 to 30 angstroms. The gate dielectric layer 108 may be formedusing a suitable process such as atomic layer deposition (ALD), chemicalvapor deposition (CVD), physical vapor deposition (PVD), thermaloxidation, UV-ozone oxidation, or combinations thereof. The gatedielectric layer 108 may further comprise an interfacial layer (notshown) to reduce damage between the gate dielectric layer 108 and thesubstrate 102. The interfacial layer may comprise silicon oxide.

In a gate last process, a dummy gate electrode layer 408 is subsequentlyformed over the gate dielectric layer 108. In some embodiments, thedummy gate electrode layer 408 may comprise a single layer or multilayerstructure. In the present embodiment, the dummy gate electrode layer 408may comprise poly-silicon. Further, the dummy gate electrode layer 408may be doped poly-silicon with the uniform or gradient doping. The dummygate electrode layer 408 may have a thickness in the range of about 30nm to about 60 nm. The dummy electrode layer 408 may be formed using alow-pressure chemical vapor deposition (LPCVD) process. In oneembodiment, the LPCVD process can be carried out in a LPCVD furnace at atemperature of about 580° C. to 650° C. and at a pressure of about 200mTorr to 1 Torr, using silane (SiH₄) or dichlorosilane (SiH₂Cl₂) as thesilicon source gas.

Then, a layer of photoresist is formed over the dummy gate electrodelayer 408 by a suitable process, such as spin-on coating, and patternedto form a patterned photoresist feature (i.e., cover one of the gates soother gate can be separately processed) the gate dielectric layer 108and the dummy gate electrode layer 408) by a proper lithographypatterning method. A width of the patterned photoresist feature is inthe range of about 15 to 45 nm. The patterned photoresist feature canthen be transferred using a dry etching process to the underlying layers(i.e., the gate dielectric layer 108 and the dummy gate electrode layer408) to form gate structures 410 p, 410 n. The photoresist layer may bestripped thereafter.

In another example, a hard mask layer (not shown) is formed over thedummy gate electrode layer 408; a patterned photoresist layer is formedon the hard mask layer; the pattern of the photoresist layer istransferred to the hard mask layer and then transferred to the dummygate electrode layer 408 and the gate dielectric layer 108 to form thegate structures 410 p, 410 n. The hard mask layer comprises siliconoxide. Alternatively, the hard mask layer may optionally comprisesilicon nitride, and/or silicon oxynitride, and may be formed using amethod such as CVD or PVD. The hard mask layer comprises a thickness inthe range from about 100 to 800 angstroms.

It is noted that the semiconductor device 400 may undergo other “gatelast” processes and other CMOS technology processing to form variousfeatures of the semiconductor device 400. As such, the various featuresare only briefly discussed herein. The various components of thesemiconductor device 400 may be formed prior to formation of the gateelectrodes 410 p, 410 n in a “gate last” process. The various componentsmay comprise lightly doped source/drain regions (p-type and n-type LDD)122 p, 122 n and source/drain regions (p-type and n-type S/D) 124 p, 124n in the active regions 104 p, 104 n and on opposite sides of the gateelectrodes 410 p, 410 n. The p-type LDD 122 p and S/D 124 p regions maybe doped with B or In, and the n-type LDD 122 n and S/D 124 n regionsmay be doped with P or As. The various features may further comprisegate spacers 126 and an interlayer dielectric (ILD) layer 128 onopposite sidewalls of the gate electrodes 410 p, 410 n. The gate spacers126 may be formed of silicon oxide, silicon nitride or other suitablematerials. The ILD 128 may include an oxide formed by ahigh-aspect-ratio process (HARP) and/or a high-density-plasma (HDP)deposition process.

Referring to FIGS. 3, 6A, 6B, and 6C, the method 300 continues with step304 in which a first opening 420 in a dielectric layer (i.e., betweenthe gate spacers 126) may be formed over the substrate 102. In thepresent embodiment, using the gate spacers 126 as hard masks, a firstportion of the dummy gate electrode layer 408 may be removed from thegate electrode 410 p to form the first opening 420 in the gate spacers126, while a second portion of the dummy gate electrode layer 408 in thegate structure 410 n are covered by a patterned photoresist layer. Thefirst portion of the dummy gate electrode layer 408 may be removed usinga dry etch process. In one embodiment, the dry etch process for thefirst portion of the dummy poly-silicon gate electrode layer 408 may beperformed under a source power of about 650 to 800 W, a bias power ofabout 100 to 120 W, and a pressure of about 60 to 200 mTorr, using Cl₂,HBr and He as etching gases.

Referring to FIGS. 3, 7A, 7B, and 7C, the method 300 continues with step306 in which a second work-function metal layer 414 p partially fillsthe first opening 420, so that a top surface 414 s of the secondwork-function metal layer 414 p is below a top surface 420 s of thefirst opening 420. The second work-function metal layer 414 p comprisesa material selected from a group of TiN, WN, TaN and Ru. The secondwork-function metal layer 414 p may be formed by CVD, PVD or othersuitable technique. In the present embodiment, the second work-functionmetal layer 414 p may be first deposited over the gate dielectric layer108, gate spacers 126, and ILD 128 to fill the first opening 420. Then,a chemical mechanical polishing (CMP) may be performed to remove thesecond work-function metal layer 414 p outside of the first opening 420.Finally, a top portion of the second work-function metal layer 414 p inthe first opening 420 may be removed by a wet etching to form a portionof a second gate electrode 410 p of the pMOSFET 400 p. The wet etchingprocess may have a high selectivity such that the wet etching processmay stop at the gate spacers 126. For example, the wet etching chemistrymay include HCl and H₂O₂ to selectively remove the top portion of thesecond work-function metal layer 414 p, so that a top surface 414 s ofthe second work-function metal layer 414 p is below a top surface 420 sof the first opening 420. The remaining second work-function metal layer414 p has a maximum thickness t₁ ranging from 150 to 350 angstroms.

Referring to FIGS. 3, 8A, 8B, and 8C, the method 300 continues with step308 in which a second opening 430 adjoining the first opening 420 in thedielectric layer (i.e., the gate spacers 126) is formed over thesubstrate 102. In one embodiment, using the gate spacers 126 andremaining second work-function metal layer 414 p as hard masks, thesecond portion of the dummy gate electrode layer 408 is removed from thegate electrode 410 n to form a second opening 430 in the gate spacers126. The second portion of the dummy gate electrode layer 408 may beremoved using a wet etch and/or a dry etch process. In one embodiment,the wet etch process for dummy poly-silicon gate electrode layer 408includes exposure to a hydroxide solution containing ammonium hydroxide,diluted HF, deionized water, and/or other suitable etchant solutions. Inother embodiments, the dry etch process for dummy poly-silicon gateelectrode layer 408 may be performed under a source power of about 650to 800 W, a bias power of about 100 to 120 W, and a pressure of about 60to 200 mTorr, using Cl₂, HBr and He as etching gases.

Referring to FIGS. 3, 9A, 9B, and 9C, the method 300 continues with step310 in which a first work-function metal layer 414 n is deposited in thefirst and second openings 420, 430, whereby the first work-functionmetal layer 414 n is over the second work-function metal layer 414 p inthe first opening 420. The first work-function metal layer 414 ncomprises a material selected from a group of Ti, Ag, Al, TiAl, TiAlN,TaC, TaCN, TaSiN, Mn, and Zr. The first work-function metal layer 414 nhas a maximum thickness t₂ ranging from 30 to 80 angstroms. Therefore,the maximum thickness t₁ of the second work-function metal layer isgreater than the maximum thickness t₂ of the first work-function metallayer. The first work-function metal layer 414 n may be formed by CVD,PVD or other suitable technique. The first work-function metal layer 414n in the first opening 420 is referred to as a second portion 414 b ofthe first work-function metal layer 414 n, and the first work-functionmetal layer 414 n in the second openings 430 is referred to as a firstportion 414 a of the first work-function metal layer 414 n. Thus thesecond portion 414 b of the first work-function metal layer 414 n andthe first portion 414 a of the first work-function metal layer 414 n arecontinuous. Further, the second portion 414 b of the first work-functionmetal layer 414 n is over the second work-function metal layer 414 p inthe first opening 420.

In some embodiments, an optional first barrier layer 412 n may bedeposited before the first work-function metal layer 414 n deposition toreduce diffusion of the signal metal layer 418 into the gate dielectric108. In the first opening 420 the first barrier layer 412 n is betweenthe second portion 414 b of the first work-function metal layer 414 nand the second work-function metal layer 414 p, and in the secondopening 430 the first barrier layer 412 n is between the first portion414 a of the first work-function metal layer 414 n and the gatedielectric layer 108. The first barrier layer 412 n comprises a materialselected from a group of TaN and WN. The first barrier layer 412 n has athickness t₃ ranging from 5 to 15 angstroms. The first barrier layer 412n may be formed by CVD, PVD or other suitable technique.

Still referring to FIGS. 3, 9A, 9B, and 9C, the method 300 continueswith step 312 in which a signal metal layer 418 is deposited over thefirst work-function metal layer 414 n in the first and second openings420, 430. The signal metal layer 418 comprises a material selected froma group of Al, Cu and W. The signal metal layer 418 may be formed byCVD, PVD or other suitable technique.

In some embodiments, an optional second barrier layer 416 n may bedeposited before the signal metal layer 418 is deposited to reducediffusion of the signal metal layer 418 into the gate dielectric 108.Thus the second barrier layer 416 n is between the first work-functionmetal layer 414 n and the signal metal layer 418. The second barrierlayer 416 n comprises a material selected from a group of TiN, TaN andWN. The second bather layer 416 n has a thickness t₄ ranging from 20 to40 angstroms. The second barrier layer 416 n may be formed by CVD, PVDor other suitable technique.

Still referring to FIGS. 3, 9A, 9B, and 9C, the method 300 continueswith step 314 in which the signal metal layer 418 is planarized. A CMPis performed to remove the signal metal layer 418, second barrier layer416 n, first work-function metal layer 414 n, and first barrier layer412 n outside of the first and second openings 420, 430. The signalmetal layer 418 in the first openings 420 is referred to as a secondportion 418 p of the signal metal layer 418, and the signal metal layer418 in the second openings 430 is referred to as a first portion 418 nof the signal metal layer 418. Thus the second portion 418 p of thesignal metal layer 418 and the first portion 418 n of the signal metallayer 418 are continuous and a single metal layer. In the presentembodiment, a maximum thickness t₅ of the second portion 418 p of thesignal metal layer 418 is less than a maximum thickness t₆ of the firstportion 418 n of the signal metal layer 418. For example, the secondportion 418 p of the signal metal layer 418 has a maximum thickness t₅ranging from 100 to 200 angstroms, and the first portion 418 n of thesignal metal layer 418 has a maximum thickness t₆ ranging from 350 to450 angstroms.

The first portion 414 a of the first work-function metal layer 414 n andthe first portion 418 n of the signal metal layer 418 are collectivelyreferred to as a first gate electrode 410 n of nMOSFET 400 n. In thepresent embodiment, the first portion 414 a of the first work-functionmetal layer 414 n is under the first portion 418 n of the signal metallayer 418. Further, the second portion 414 b of the first work-functionmetal layer 414 n, the second work-function metal layer 414 p and thesecond portion 418 p of the signal metal layer 418 are collectivelyreferred to as a second gate electrode 410 p of pMOSFET 400 p. In thepresent embodiment, the second portion 414 b of the first work-functionmetal layer 414 n is interposed between the second work-function metallayer 414 p and the second portion 418 p of the signal metal layer 418.Further, the second portion 418 p of the signal metal layer 418 is overthe second portion 414 b of the first work-function metal layer 414 n.

In the present embodiment, the interconnect structure 410 comprises thefirst gate electrode 410 n and second gate electrode 410 p. It should benoted as in FIG. 4 that both the first portion 418 n and the secondportion 418 p of the signal metal layer 418 comprise same low-resistanceconductive material. Therefore, a shift in the position of the contact430 to the signal metal layer 418 does not change the contact resistanceto either MOSFETs 400 p/400 n since both MOSFETs contact the same signalmetal layer 418. Applicant's method of fabricating a semiconductordevice 400 may fabricate a fixed-contact-resistance interconnectionstructure 410 to provide a stable voltage supply to the interconnectionstructure 410, thereby enhancing the device performance.

It is understood that the semiconductor device 400 may undergo furtherCMOS processes to form various features such as contacts/vias,interconnect metal layers, dielectric layers, passivation layers, etc.It has been observed that the modified interconnection structure 410used as the gate contact material provides a contact resistance to thesemiconductor device 400 that is less sensitive to process variations.

One aspect of this description relates to a method for fabricating aninterconnection structure in a complementary metal-oxide-semiconductor(CMOS). The method includes forming an opening in a dielectric layerover a substrate and forming a dummy electrode in a first portion of theopening in the dielectric layer. The method further includes filling asecond portion of the opening with a second work-function metal layer,wherein a top surface of the second work-function metal layer is below atop surface of the opening and removing the dummy electrode. The methodfurther includes depositing a first work-function metal layer in thefirst and second portions, whereby the first work-function metal layeris over the second work-function metal layer in the opening anddepositing a signal metal layer over the first work-function metal layerin the first and second portions.

Another aspect of this description relates to a method for fabricatingan interconnection structure in a complementarymetal-oxide-semiconductor (CMOS). The method includes forming a firstopening in a dielectric layer over a substrate and partially filling thefirst opening with a second work-function metal layer, wherein a topsurface of the second work-function metal layer is below a top surfaceof the first opening. The method further includes forming a secondopening adjoining the first opening in the dielectric layer over thesubstrate and depositing a first work-function metal layer in the firstand second openings, whereby the first work-function metal layer is overthe second work-function metal layer in the first opening.

Still another aspect of this description relates to a method forfabricating an interconnection structure in a complementarymetal-oxide-semiconductor (CMOS). The method includes forming an openingin a dielectric layer over a substrate and filling a first portion ofthe opening with a second work-function metal layer. A top surface ofthe second work-function metal layer is below a top surface of theopening. The method further includes depositing a first work-functionmetal layer in the first portion of the opening and in a second portionof the opening different from the first portion, whereby the firstwork-function metal layer is over the second work-function metal layerin the opening. The method further includes depositing a signal metallayer over the first work-function metal layer in the first and secondportions.

While the description has been described by way of example and in termsof the exemplary embodiments, it is to be understood that theapplication is not limited to the disclosed embodiments. To thecontrary, it is intended to cover various modifications and similararrangements (as would be apparent to those skilled in the art).Therefore, the scope of the appended claims should be accorded thebroadest interpretation so as to encompass all such modifications andsimilar arrangements. The embodiments can be used to form or fabricatean interconnection structure for semiconductor devices. In this way, aninterconnection structure has a fixed-contact-resistance.

What is claimed is:
 1. A method of fabricating an interconnectionstructure in a complementary metal-oxide-semiconductor (CMOS),comprising: forming an opening in a dielectric layer over a substrate;forming a dummy electrode in a first portion of the opening in thedielectric layer; filling a second portion of the opening with a secondwork-function metal layer, wherein a top surface of the secondwork-function metal layer is below a top surface of the opening;removing the dummy electrode; depositing a first work-function metallayer in the first and second portions, whereby the first work-functionmetal layer is over the second work-function metal layer in the opening;and depositing a signal metal layer over the first work-function metallayer in the first and second portions.
 2. The method of claim 1,further comprising: forming a first barrier layer between the firstwork-function metal layer and the second work-function metal layer. 3.The method of claim 2, wherein the forming the first barrier layercomprises forming a layer having a thickness ranging from 5 Angstroms(Å) to 15 Å.
 4. The method of claim 1, further comprising: forming asecond barrier layer between the signal metal layer and the secondwork-function metal layer.
 5. The method of claim 4, wherein the formingthe second barrier layer comprises forming a layer having a thicknessranging from 20 Å to 40 Å.
 6. The method of claim 1, further comprisingforming a gate dielectric layer between the second work function layerand the substrate and between the dummy electrode and the substrate. 7.The method of claim 1, wherein the filling the second portion of theopening with the second work-function metal layer comprises forming alayer having a thickness ranging from 150 Å to 350 Å.
 8. The method ofclaim 1, wherein the depositing the first work-function metal layercomprises forming a layer having a thickness ranging from 30 Å to 80 Å.9. The method of claim 1, wherein the depositing the signal metal layercomprises forming the signal metal layer in the first portion having athickness ranging from 350 Å to 450 Å, and forming the signal metallayer in the second portion having a thickness ranging from 100 Å to 200Å.
 10. A method of fabricating an interconnection structure in acomplementary metal-oxide-semiconductor (CMOS), comprising: forming afirst opening in a dielectric layer over a substrate; partially fillingthe first opening with a second work-function metal layer, wherein a topsurface of the second work-function metal layer is below a top surfaceof the first opening; forming a second opening adjoining the firstopening in the dielectric layer over the substrate; and depositing afirst work-function metal layer in the first and second openings,whereby the first work-function metal layer is over the secondwork-function metal layer in the first opening.
 11. The method of claim10, wherein the partially filling the first opening with the second workfunction layer comprises forming a layer comprising at least one of TiN,WN, TaN or Ru.
 12. The method of claim 10, wherein the partially fillingthe first opening with the second work function layer comprises forminga layer having a thickness ranging from 150 angstroms (Å) to 350 Å. 13.The method of claim 10, wherein the depositing the first work-functionmetal layer comprises depositing a layer comprising at least one of Ti,Ag, Al, TiAl, TiAlN, TaC, TaCN, TaSiN, Mn or Zr.
 14. The method of claim10, wherein the depositing the first work-function metal layer comprisesdepositing a layer having a thickness ranging from 30 Å to 80 Å.
 15. Themethod of claim 10, further comprising forming a barrier layer over thesubstrate, wherein the barrier layer is between the first work functionmetal layer and the substrate, and wherein the barrier layer has athickness ranging from 5 Å to 15 Å.
 16. The method of claim 15, whereinthe forming the barrier layer comprises forming the barrier layer overthe second work function metal layer.
 17. The method of claim 10,further comprising depositing a signal metal layer over the first workfunction metal layer and the second work function metal layer, whereinthe signal metal layer comprises at least one of Al, Cu or W.
 18. Themethod of claim 10, further comprising forming a dummy gate electrodelayer over the substrate, wherein the forming the first openingcomprises removing a first portion of the dummy gate electrode layer.19. The method of claim 18, wherein the forming the second openingcomprises removing a second portion of the dummy gate electrode layerseparate from the first portion.
 20. A method of fabricating aninterconnection structure in a complementary metal-oxide-semiconductor(CMOS), comprising: forming an opening in a dielectric layer over asubstrate; filling a first portion of the opening with a secondwork-function metal layer, wherein a top surface of the secondwork-function metal layer is below a top surface of the opening;depositing a first work-function metal layer in the first portion of theopening and in a second portion of the opening different from the firstportion, whereby the first work-function metal layer is over the secondwork-function metal layer in the opening; and depositing a signal metallayer over the first work-function metal layer in the first and secondportions.
 21. The method of claim 20, further comprising forming abather layer between the first work-function metal layer and the secondwork-function metal layer.